Block Copolymer Nanopatterning for Semiconductor Device

Block copolymer nanolithography is an emerging nanolithographic process utilizing self-assembled nanoscale morphologies of block copolymers,
and can provide well-ordered device-oriented nanostructures by various directed assembly techniques.
Block copolymer nanopattern is an ideal template to assemble functional nanomaterials into device.
We are developing novel strategies to direct block copolymer self-assembly,
and utilizing block copolymer templates in various nanoelectronics, photonics, energy and semiconductor devices.