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Block Copolymer Nanolithography

Block copolymer nanolithography is an emerging nanolithographic process utilizing self-assembled nanoscale morphologies of block copolymers, and can provide well-ordered device-oriented nanostructures by directed assembly techniques such as epitaxial self-assembly or graphoepitaxy. Block copolymer nanopattern is an ideal template to assemble functional nanomaterials into device. We are developing novel strategies to direct block copolymer self-assembly, and utilizing block copolymer templates in nanoelectronics, photonics and energy devices.

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