Block Copolymer Nanopatterning for Semiconductor Device

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Block Copolymer Nanopatterning for Semiconductor and IoT Devices

Block copolymer nanolithography is an emerging nanolithographic process utilizing self-assembled nanoscale morphologies of block copolymers,
and can provide well-ordered device-oriented nanostructures by various directed assembly techniques.
Block copolymer nanopattern is an ideal template to assemble functional nanomaterials into device.
We are developing novel strategies to direct block copolymer self-assembly,
and utilizing block copolymer templates in various nanoelectronics, photonics, energy and semiconductor devices.

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    nanostructure
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    defect-free
    nanostructure
    Nature 424, 411,2003
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    for device
    oriented nanostructure
    Science 308,1442, 2005
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Nat. Commun. 7,12911,2016
Adv. Mater. 29, 1700595, 2017
ACS Nano 10,3435,2016
Adv. Mater. 28, 1591, 2016
Adv. Funct. Mater. 805023,2018
Mol. Syst. Des. Eng. 2,560,2017

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
335 Gwahangno(373-1 Guseong-dong), Yuseong-gu, Daejeon, 305-701, Republic of Korea

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