Block copolymer nanolithography is an emerging nanolithographic process utilizing self-assembled nanoscale morphologies of block copolymers,
and can provide well-ordered device-oriented nanostructures by various directed assembly techniques.
Block copolymer nanopattern is an ideal template to assemble functional nanomaterials into device.
We are developing novel strategies to direct block copolymer self-assembly,
and utilizing block copolymer templates in various nanoelectronics, photonics, energy and semiconductor devices.
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
335 Gwahangno(373-1 Guseong-dong), Yuseong-gu, Daejeon, 305-701, Republic of Korea
TEL : +82-42-350-3339 | FAX : +82-42-350-3310